Hafnium Oxide Nanopowder (HfO2, 99.99%,high purity, 61-80nm)

Technical Specifications

1. Product Name: Hafnium Oxide Nanopowder
   • Chemical Formula: HfO₂ (Hafnium Dioxide)
   • CAS Number: 12055-23-1
2. Purity
   • Grade: 99.99% (high purity)
   • Impurities: ≤0.01% (trace elements and other oxides)
3. Particle Size
   • Range: 61–80 nm
   • Particle Size Distribution: Verified using SEM (Scanning Electron Microscopy) or TEM (Transmission Electron Microscopy)
4. Morphology
   • Shape: Spherical or irregular particles with uniform distribution
   • Surface Area: High due to nanoscale dimensions, enhancing reactivity and catalytic properties
5. Crystal Structure
   • Phase: Tetragonal or monoclinic
6. Physical and Chemical Properties
   • Color: White or off-white powder
   • Density: ~9.68 g/cm³
   • Melting Point: ~2,800 °C (one of the highest melting points for any oxide material)
   • Thermal Stability: Extremely stable at high temperatures
   • Electrical Properties: Insulating, with high dielectric constant
7. Packaging and Storage
   • Standard Packaging: Sealed in airtight, moisture-resistant containers to prevent contamination and agglomeration
   • Storage Conditions: Store in a cool, dry place; avoid prolonged exposure to air and moisture
   • Shelf Life: Stable under proper storage conditions
8. Safety and Handling
   • Hazards:
     • Hafnium oxide dust may irritate the respiratory system, skin, and eyes if inhaled or exposed.
     • Not highly toxic, but should be handled with care to prevent airborne particles.
   • Recommended Protective Measures:
     • Use PPE (e.g., gloves, goggles, and dust masks).
     • Ensure adequate ventilation when handling.

Applications

1. Semiconductor and Electronics Industry
   • High-K Dielectrics: Hafnium oxide is widely used in the semiconductor industry as a gate dielectric material in advanced MOSFETs (metal-oxide-semiconductor field-effect transistors) to reduce leakage currents and improve performance.
   • Memory Devices: It is used in non-volatile memory devices, including ferroelectric random access memory (FeRAM) and resistive random access memory (ReRAM).
2. Optical Coatings and Lenses
   • High-Performance Optical Coatings: Hafnium oxide is used in optical coatings due to its high refractive index, which makes it ideal for use in coatings for lenses, mirrors, and optical components.
   • Laser Technology: Hafnium oxide is applied in laser materials and optical devices for high-temperature and high-power applications.
3. Catalysis
   • Catalytic Support: Hafnium oxide is utilized as a support for catalytic materials in various reactions such as oxidation, hydrogenation, and cracking processes in the petroleum industry.
   • Catalytic Reactions: Its high stability and surface area make it a suitable catalyst in the production of fine chemicals and the processing of petrochemical products.
4. Nuclear Applications
   • Nuclear Reactor Technology: Hafnium oxide is used in nuclear reactors as a neutron absorber due to its ability to capture neutrons, which makes it ideal for use in reactor control rods.
   • Radiation Shielding: Its high density and stability at high temperatures also make it useful in radiation shielding applications.
5. Biomedical Applications
   • Biomedical Implants: Hafnium oxide is being researched for its potential use in medical implants and prosthetics due to its biocompatibility and resistance to corrosion in biological environments.
   • Drug Delivery: It is explored as a potential carrier for targeted drug delivery systems, leveraging its nanoscale properties for better bioavailability.
6. Energy Storage and Conversion
   • Batteries and Capacitors: Hafnium oxide is used in advanced battery technologies, including lithium-ion and supercapacitors, due to its high dielectric properties.
   • Energy Harvesting: It is also used in devices designed to harvest energy from heat sources (thermoelectric generators).
7. High-Temperature Applications
   • Thermal Insulation: Due to its high melting point and thermal stability, hafnium oxide is used in high-temperature applications such as heat shields, thermal barrier coatings for turbine blades, and other aerospace components.
   • Refractory Materials: It is also used in refractory materials for applications requiring extreme temperature resistance.
8. Research and Development
   • Material Science: Hafnium oxide is extensively studied for its unique properties, particularly in nanostructured and thin-film applications.
   • Prototype Development: It is used in experimental setups for developing next-generation materials for electronics, optics, and energy systems.

Key Features

• High Purity (99.99%): Ensures superior performance and reliability in advanced applications, particularly in semiconductors and optics.
• Nanoscale Size (61–80 nm): Provides excellent reactivity, surface area, and high-performance properties for various industrial and research applications.
• Thermal and Chemical Stability: Ideal for high-temperature and high-performance applications in electronics, optics, and nuclear industries.